Multiresolution Mask Writing
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Issued Date -
Jul 31, 2014
app pub date -
Aug 14, 2013
filing date -
Jul 1, 2010
priority date (Note) -
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status (Latency Note)
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Abstract
Mask writing techniques that employ multiple masking writing passes. A first writing pass is made to write a first shot pattern having a first resolution. A second writing pass is then made to write a second shot pattern having a second resolution finer than the first resolution, such that the second shot pattern substantially overlaps with the first shot pattern on the mask substrate.
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