RADIATION SOURCE AND LITHOGRAPHIC APPARATUS

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United States of America Patent

APP PUB NO 20140218706A1
SERIAL NO

14241370

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Abstract

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A radiation source comprises a nozzle configured to direct a stream of fuel droplets (400) along a trajectory towards a plasma formation location and a laser configured to direct laser radiation to the plasma formation location to convert the fuel droplets at the plasma formation location into a plasma. The laser comprises an amplifier (310, 320) and an optical element (500) configured to define a divergent beam path for radiation passing through the amplifier.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Loopstra, Erik Roelof Eindhoven, NL 325 13265
Wagner, Christian Duizel, DE 95 1076

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