Photoactive compound and photosensitive resin composition comprising the same
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United States of America Patent
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Oct 28, 2014
Grant Date -
Aug 7, 2014
app pub date -
May 14, 2012
filing date -
Aug 4, 2011
priority date (Note) -
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Abstract
The present invention relates to a photoactive compound having a novel structure and a photosensitive resin composition including the same, and the photoactive compound according to the present invention has excellent sensitivity due to efficient absorption to a UV light source by including a nitro group and a phosphonate structure, and has excellent retention rate, mechanical strength, heat resistance, chemical resistance and developing resistance by improving solubility of the photosensitive resin composition by excellent compatibility of the phosphonate structure and a binder resin. Therefore, the photosensitive resin composition according to the present invention is useful to cure a column spacer, an overcoat, a passivation material and the like of a liquid crystal display device, and is useful in view of a high temperature process property.
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