SURFACE SELECTIVE POLISHING COMPOSITIONS
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United States of America Patent
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Issued Date -
Aug 7, 2014
app pub date -
Jan 31, 2014
filing date -
Feb 1, 2013
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Abandoned
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Abstract
The disclosure provides polishing compositions that show a high polishing rate ratio of a silicon nitride (SiN) surface to a silicon oxide surface, and/or of a SiN surface to a polycrystalline silicon (Poly Si) surface. Such compositions comprise, in certain aspects, of colloidal silica, and one or more water soluble polymers, and has a pH of 6 or less, wherein the colloidal silica comprises one or more organic acids bound to its surface, and the water soluble polymer is a polyoxyalkylene hydrocarbyl ether which hydrocarbyl moiety has 12 or more carbon atoms.
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