PHENOL-BASED SELF-CROSSLINKING POLYMER AND RESIST UNDERLAYER FILM COMPOSITION INCLUDING SAME
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United States of America Patent
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Issued Date -
Aug 14, 2014
app pub date -
Sep 5, 2012
filing date -
Sep 6, 2011
priority date (Note) -
Abandoned
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Abstract
A phenolic self-crosslinking polymer whose self-crosslinking reaction at a heating step is performed without additives for hardening the polymer, and a composition of resist-underlayer-film containing the same, are disclosed. The phenolic self-crosslinking polymer being selected from a group consisting of a polymer represented by Formula 1, a polymer represented by Formula 2 and a polymer represented by Formula 3:
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