Production method and evaluation apparatus for mask layout

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United States of America Patent

PATENT NO 9086634
APP PUB NO 20140242498A1
SERIAL NO

14013213

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Abstract

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According to one embodiment, a production method for a mask layout of an exposure mask includes evaluating a candidate layout by comparison between an imaged image group and a reference image group. The imaged image group is composed of a plurality of imaged images of patterns formed by performing lithography under a plurality of levels of exposure condition using the candidate layout. The reference image group is composed of a plurality of reference images produced by simulation on assumption of a plurality of levels of the exposure condition.

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Patent Owner(s)

  • KABUSHIKI KAISHA TOSHIBA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kai, Yasunobu Kanagawa-ken, JP 26 70
Kodama, Chikaaki Tokyo, JP 51 387
Kono, Yuko Tokyo, JP 8 20
Kotani, Toshiya Tokyo, JP 132 1394
Masukawa, Kazuyuki Kanagawa-ken, JP 22 68

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