Reflective mask, method of monitoring the same, and method of manufacturing semiconductor device

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United States of America Patent

PATENT NO 9128381
APP PUB NO 20140242733A1
SERIAL NO

14022570

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Abstract

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According to one embodiment, provided is a reflective mask having a substrate, a reflection layer that reflects EUV light formed above the substrate, and an absorption layer that absorbs the EUV light formed above the reflection layer. The reflective mask further includes a monitor pattern monitoring an attachment amount of contamination attached during exposure.

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Patent Owner(s)

  • TOSHIBA MEMORY CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Koike, Takashi Mie, JP 119 1290

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