Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern

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United States of America Patent

PATENT NO 9454079
APP PUB NO 20140248562A1
SERIAL NO

14271606

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Abstract

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According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including

    (A) a compound represented by a general formula (1) below that generates an acid when exposed to actinic rays or radiation, and(B) a resin.

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Patent Owner(s)

  • FUJIFILM CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fukuhara, Toshiaki Shizuoka, JP 52 276
Ito, Junichi Shizuoka, JP 210 3215
Iwato, Kaoru Shizuoka, JP 69 420
Kataoka, Shohei Shizuoka, JP 39 196
Matsuda, Tomoki Shizuoka, JP 18 58
Shibuya, Akinori Shizuoka, JP 81 336
Sugiyama, Shinichi Shizuoka, JP 42 286
Tango, Naohiro Shizuoka, JP 29 62
Tokugawa, Yoko Shizuoka, JP 7 19
Yoshidome, Masahiro Shizuoka, JP 22 37

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