POLISHING COMPOSITION
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United States of America Patent
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Issued Date -
Sep 11, 2014
app pub date -
Sep 28, 2012
filing date -
Sep 30, 2011
priority date (Note) -
Abandoned
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Abstract
A polishing composition of the present invention is used for polishing an object containing a phase-change alloy and is characterized by containing ammonium ions (NH4+). The polishing composition may further contain abrasive grains, such as colloidal silica.
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