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Abstract

A wafer-level package device and techniques are described that include utilizing a dry-etch process for mitigating metal seed layer undercut. In an implementation, a process for fabricating the wafer-level package device that employs the techniques of the present disclosure includes processing a substrate, depositing a metal seed layer on the substrate, depositing and patterning a resist layer, depositing a redistribution layer structure, removing the photoresist layer, and dry-etching the metal seed layer. In implementations, the wafer-level package device that employs example techniques in accordance with the present disclosure includes a substrate, a metal seed layer disposed on the substrate, and a redistribution layer structure formed on the metal seed layer. The metal seed layer is dry-etched so that undercut is mitigated.

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First Claim