TUNABLE WAVELENGTH ILLUMINATION SYSTEM

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United States of America Patent

APP PUB NO 20140253891A1
SERIAL NO

14281346

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A lithographic apparatus comprises an alignment system including a tunable narrow pass-band filter configured to receive a broad-band radiation and to filter the broad-band radiation into narrow-band linearly polarized radiation. The tunable narrow pass-band filter is further configured to modulate an intensity and wavelength of the narrow-band radiation and to provide a plurality of pass-band filters at a same time or nearly the same time. The alignment system further includes a relay and mechanical interface configured to receive the narrow-band radiation and to adjust a profile of the narrow-band radiation based on physical properties of alignment targets on a substrate. The adjusted narrow-band radiation is focused on the alignment targets using a focusing system.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VDE RUN 6501 VELDHOVEN NL-5504 DR

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ANDRESEN, Keith William Wilton, US 3 13
DEN, BOEF Arie Jeffrey Waalre, NL 200 2311
EBERT,, JR Earl William Oxford, US 5 35
SEWELL, Harry Ridgefield, US 73 1452
SINGH, Sanjeev Kumar Danbury, US 38 231

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