Curable composition for imprint, pattern-forming method and pattern

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United States of America Patent

PATENT NO 8933144
SERIAL NO

14212807

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Abstract

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Provide a curable composition for imprint, which is improved in the surface roughness of the cured film. A curable composition for imprint comprising a polymerizable compound (A), a polymerization initiator (B), and a non-polymerizable compound (C),

    the non-polymerizable compound (C) comprising at least one species of surfactant (C1) which contains 20% by mass or more of fluorine atom, and, at least one species of polymer (C2) which contains 3% by mass or more and less than 20% by mass of fluorine atom and/or 5% by mass or more and less than 40% by mass of silicon atom, and has a weight-average molecular weight (Mw) of 1,000 to 100,000.

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Patent Owner(s)

  • FUJIFILM CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Enomoto, Yuichiro Haibara-gun, JP 38 338
Kodama, Kunihiko Haibara-gun, JP 160 2223
Tarutani, Shinji Haibara-gun, JP 46 792

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