Substrate processing device and substrate processing method

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United States of America Patent

PATENT NO 10276406
APP PUB NO 20140261566A1
SERIAL NO

14212899

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Abstract

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A substrate processing device includes a suction drying section drying a surface of a substrate by absorbing and removing a liquid droplet of volatile solvent formed on the surface of the substrate by a heating operation of a heating section.

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Patent Owner(s)

  • SHIBAURA MECHATRONICS CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Abe, Masahiro Yokohama, JP 192 3368
Furuya, Masaaki Yokohama, JP 41 175
Hayashi, Konosuke Yokohama, JP 28 105
Kinase, Atsushi Yokohama, JP 14 98
Nagashima, Yuji Yokohama, JP 31 703
Ootagaki, Takashi Yokohama, JP 12 47

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