SUBSTRATE CLEANING AND DRYING METHOD AND SUBSTRATE DEVELOPING METHOD
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United States of America Patent
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Issued Date -
Sep 18, 2014
app pub date -
Jan 16, 2014
filing date -
Mar 15, 2013
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Provided is a substrate cleaning and drying method, including a cleaning step of cleaning a developed substrate by supplying a cleaning liquid to the substrate; a puddle-forming step of forming a puddle of the cleaning liquid on the substrate; a film-thinning step of thinning a film thickness of the cleaning liquid on the substrate; and a drying step of drying the substrate by spinning the substrate and generating outward airflow and inward airflow between the outward airflow and the substrate, the outward airflow covering a portion above the substrate and the inward airflow causing removal of the cleaning liquid on the substrate.
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