Plasma emission monitor and process gas delivery system

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United States of America Patent

PATENT NO 9633823
APP PUB NO 20140262751A1
SERIAL NO

13803371

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Abstract

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A gas manifold for delivery gas to a sputtering chamber is provided with ports to accommodate plasma emission monitors to monitor plasma information in the sputtering chamber to provide feedback control. The collimators of the plasma emission monitors is exposed to gas flow and thus coating of the monitor is greatly reduced.

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Patent Owner(s)

  • CARDINAL CG COMPANY

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Burrows, Keith J Mineral Point, US 12 101
Gruber, Christopher L Plain, US 1 0
Hartig, Klaus H W Avoca, US 9 33

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