OPTICAL METROLOGY BY LIGHT BEAM ANALYSIS

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United States of America Patent

APP PUB NO 20140267702A1
SERIAL NO

14211502

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Methods and systems are disclosed including a first light source producing a first light beam and a second light source producing a second light beam into a detection area; the first light beam overlapping the second light beam at a predetermined distance above the inspection base; at least one image processing system comprising one or more light detectors adapted to remotely sense the first and second light beam and generate one or more output signals indicative of one or more patterns produced on a top of an object by the first and second light beam; and one or more processors running computer executable instructions that when executed by the processor causes the image processing system to receive the output signal and determine height of the object by analyzing location of the first light beam relative to the second light beam in the one or more pattern.

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Patent Owner(s)

Patent OwnerAddress
SIEMENS HEALTHCARE DIAGNOSTICS INC511 BENEDICT AVENUE TARRYTOWN NY 10591

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Profitt, James A Palmer Lake, US 52 475

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