Exposure apparatus, stage apparatus, and device fabrication method for transferring a pattern of a reticle onto a substrate
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United States of America Patent
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Apr 25, 2017
Issued Date -
N/A
app pub date -
Mar 19, 2014
filing date -
Mar 19, 2013
priority date (Note) -
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status (Latency Note)
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Abstract
The present invention provides an exposure apparatus which transfers a pattern of a reticle onto a substrate, including a stage configured to place the reticle, a holding mechanism configured to hold the reticle placed on the stage, a driving unit configured to drive the stage, a determination unit configured to determine a feature including at least one of a type or shape of the reticle placed on the stage, and a decision unit configured to decide, based on the feature determined by the determination unit, at least one of a holding state of the reticle held by the holding mechanism, or control regarding driving of the stage.
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