PATTERN FORMING METHOD AND MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM
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United States of America Patent
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Issued Date -
Sep 25, 2014
app pub date -
Sep 3, 2013
filing date -
Mar 22, 2013
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
According to exemplary embodiments, a pattern forming method includes: forming a diblock copolymer coating film by applying coating liquid containing a diblock copolymer including a chain of a first polymer and a chain of a second polymer which is not compatible with the first polymer, and a homopolymer having affinity with the first polymer, on a substrate, and drying the liquid; and performing phase separation of the first polymer and the second polymer by providing a coating film for solvent annealing using a solvent having compatibility with the second polymer.
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