SINGLE POINT LINEAR EVAPORATION SOURCE SYSTEM
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United States of America Patent
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Issued Date -
Oct 2, 2014
app pub date -
Jul 30, 2013
filing date -
Apr 1, 2013
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The disclosure discloses a single point linear evaporation source system comprising a body, an evaporator and two guiding plates. The body comprises an elongated chamber, and the surface of the body towards the substrate is provided with a plurality of nozzles communicating with the chamber for ejecting evaporating vapor towards the substrate. The evaporator comprises an opening portion communicating with the chamber. Two guiding plates are disposed inclinedly at two ends of the chamber, and the periphery of the guiding plates are in sealing connection with the body, and the distance between two ends of the two guiding plates adjacent to the substrate is larger than the distance between two ends of the two guiding plates adjacent to the evaporator. The disclosure improves the balance performance of the vapor pressure inside the chamber, and improves the uniformity of the film deposited on the substrate.
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