Wavefront aberration measuring method, wavefront aberration measuring apparatus and optical element manufacturing method

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United States of America Patent

PATENT NO 9557241
APP PUB NO 20140293275A1
SERIAL NO

14224285

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Abstract

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The wavefront aberration measuring method includes measuring an intensity distribution of a measuring light transmitted through or reflected by an object to be measured, by using a light-receiving sensor, calculating a first differential wavefront which is a differential wavefront of the measuring light on the light-receiving sensor, and calculating a second differential wavefront by performing a correction process on the first differential wavefront depending on an incident angle of the measuring light to the light-receiving sensor. The method further includes calculating a wavefront aberration of the object by using the second differential wavefront.

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Patent Owner(s)

  • CANON KABUSHIKI KAISHA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kato, Seima Utsunomiya, JP 19 91

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