REDUCED CONSUMPTIONS STAND ALONE RINSE TOOL HAVING SELF-CONTAINED CLOSED-LOOP FLUID CIRCUIT, AND METHOD OF RINSING SUBSTRATES USING THE SAME
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United States of America Patent
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Issued Date -
Oct 16, 2014
app pub date -
Aug 20, 2012
filing date -
Aug 19, 2011
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Abstract
A system and method for rinsing substrates. In one embodiment, method comprises: a) providing a fixed volume of a rinse fluid in a rinse tool comprising a closed-loop fluid-circuit comprising a rinse tank, a deionizer, a pump, and a recirculation line fluidly coupled to an outlet of the rinse tank and an inlet of the rinse tank; and b) performing a plurality of rinse cycles in the rinse tool, each of the plurality of rinse cycles including: b-1) positioning a batch of substrates in the rinse tank; b-2) circulating the fixed volume of the rinse fluid through the fluid circuit for a rinse time, wherein during said circulation the rinse fluid contacts the batch of substrates, thereby becoming ionically contaminated rinse fluid, the deionizer removing ionic impurities from the ionically contaminated rinse fluid to produce deionized rinse fluid; and b-3) removing the batch of substrates from the rinse tank.
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