APPARATUS AND METHOD FOR CONTROLLED DEPOSITION OF AEROSOLIZED PARTICLES ONTO A SUBSTRATE
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United States of America Patent
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Issued Date -
Oct 16, 2014
app pub date -
Apr 7, 2014
filing date -
Apr 10, 2013
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
An apparatus for the controlled deposition of particles onto a film or a substrate, including: a frame arranged to support a film or a substrate having first and second surfaces facing in first and second opposite directions, respectively; a nozzle arranged to emit a stream of particles charged with a first polarity toward the first surface; and an electrode: charged with a second polarity, opposite the first polarity, and located adjacent the second surface; and arranged to attract the stream of particles to a region of the first surface. A line orthogonal to the first surface passes through the region and the electrode.
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