Method of producing semiconductor substrate product, and etching method to be used therein
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 13, 2015
Grant Date -
Oct 16, 2014
app pub date -
Jun 26, 2014
filing date -
Dec 27, 2011
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method of producing a semiconductor substrate product, the method containing: a step of preparing an aqueous solution containing 7% by mass or more and 25% by mass or less of a quaternary alkyl ammonium hydroxide; a step of preparing a semiconductor substrate having a silicon film comprising a polycrystalline silicon film or an amorphous silicon film; and a step of heating the aqueous solution at 80° C. or higher and applying the resultant aqueous solution onto the semiconductor substrate to etch at least a part of the silicon film.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully