POLISHING FILM

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United States of America Patent

APP PUB NO 20140311044A1
SERIAL NO

14238324

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention provides a polishing film with which, even when water containing impurity ions is used as a polishing liquid, the abrasive particles comprising SiO2 are less apt to adhere to the polished surface, e.g., the polished surface of an end of an optical fiber itself, and which is less apt to cause the optical loss attributable to scratches or edge chips in the polished surface. The polishing film hence renders good finish-polishing quality possible. This polishing film is characterized by comprising a substrate and an abrasive layer which has been disposed on a surface of the substrate and which comprises abrasive particles comprising SiO2, a binder resin, and an adhesion inhibitor containing a phosphorus compound.

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Patent Owner(s)

Patent OwnerAddress
BANDO CHEMICAL INDUSTRIES LTD6-6 MINATOJIMA MINAMIMACHI 4-CHOME CHUO-KU KOBE-SHI 650-0047

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mukai, Fumihiro Kobe-shi, JP 7 21
Saito, Kazuo Kobe-shi, JP 225 2810
Taura, Toshikazu Kobe-shi, JP 7 2

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