Method and system for adaptively scanning a sample during electron beam inspection

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United States of America Patent

PATENT NO 9257260
SERIAL NO

14260053

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Abstract

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A system for adaptive electron beam scanning may include an inspection sub-system configured to scan an electron beam across the surface of a sample. The inspection sub-system may include an electron beam source, a sample stage, a set of electron-optic elements, a detector assembly and a controller communicatively coupled to one or more portions of the inspection sub-system. The controller may assess one or more characteristics of one or more portions of an area of the sample for inspection and, responsive to the assessed one or more characteristics, adjust one or more scan parameters of the inspection sub-system.

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Patent Owner(s)

  • KLA-TENCOR CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, David Portland, US 286 8248
Fan, Gary Fremont, US 2 9
Kini, Vivekanand Sunnyvale, US 3 73
Xiao, Hong Pleasanton, US 115 2781

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