VAPOR CONCENTRATION CONTROL SYSTEM, VAPOR CONCENTRATION CONTROL DEVICE AND CONTROL PROGRAM
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United States of America Patent
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N/A
Issued Date -
Oct 30, 2014
app pub date -
Apr 24, 2014
filing date -
Apr 25, 2013
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The present claimed invention includes a first flow channel where a carrier gas or a mixed gas flows, a switch valve that is for flowing the mixed gas or the carrier gas to the first flow channel selectively, a fluid adjusting valve that adjusts a concentration of a gas flowing in the first flow channel, and a control part that conducts a feedback control on an opening degree of the fluid adjusting valve, and is characterized such that the control part initiates the feedback control by the use of an opening degree of the fluid adjusting valve at a time just before the gas flowing in the first flow channel is switched from the mixed gas to the carrier gas as an initial opening degree of the fluid adjusting valve at a time when the gas flowing in the first flow channel is again switched to the mixed gas afterward.
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