Apparatus and method for deterministic control of surface figure during full aperture pad polishing
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United States of America Patent
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Oct 10, 2017
Issued Date -
N/A
app pub date -
Oct 16, 2013
filing date -
Jan 29, 2009
priority date (Note) -
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Abstract
A polishing system configured to polish a lap includes a lap configured to contact a workpiece for polishing the workpiece; and a septum configured to contact the lap. The septum has an aperture formed therein. The radius of the aperture and radius the workpiece are substantially the same. The aperture and the workpiece have centers disposed at substantially the same radial distance from a center of the lap. The aperture is disposed along a first radial direction from the center of the lap, and the workpiece is disposed along a second radial direction from the center of the lap. The first and second radial directions may be opposite directions.
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