Electron beam plasma source with remote radical source

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9564297
APP PUB NO 20140339980A1
SERIAL NO

14307945

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

In a plasma reactor for processing a workpiece, an electron beam is employed as the plasma source, and a remote radical source is incorporated with the process chamber.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

  • APPLIED MATERIALS, INC.

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Collins, Kenneth S San Jose, US 308 25148
Dorf, Leonid San Jose, US 71 1268
Lane, Steven Porterville, US 68 1096
Ramaswamy, Kartik San Jose, US 347 17329
Rauf, Shahid Pleasanton, US 149 4883
Tavassoli, Hamid Cupertino, US 36 901
Wu, Ming-Feng San Jose, US 34 275
Zhang, Ying Sunnyvale, US 844 11140

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
7.5 Year Payment $3600.00 $1800.00 $900.00 Aug 7, 2024
11.5 Year Payment $7400.00 $3700.00 $1850.00 Aug 7, 2028
Fee Large entity fee small entity fee micro entity fee
Surcharge - 7.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00