Small Feature Size Fabrication Using a Shadow Mask Deposition Process
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United States of America Patent
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Issued Date -
Nov 20, 2014
app pub date -
May 20, 2014
filing date -
May 20, 2013
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
In a system and method of depositing material on a substrate, a shadow mask, including one or more apertures therethrough, in intimate contact with the substrate is provided inside of a chamber or reactor. Material ejected from a solid target material is deposited on one or more portions of the substrate after passage through the one or more apertures of the shadow mask. Desirably, a target-to-substrate distance is within a mean free path length at a specified deposition pressure. Alternatively, an electric field acts on a process gas to create a plasma that includes ionized atoms or molecules of the material that are deposited on one or more portions of the substrate after passage through the one or more apertures of the shadow mask.
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