Imprinting method, imprinting apparatus, and device manufacturing method
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United States of America Patent
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Sep 13, 2016
Grant Date -
Nov 27, 2014
app pub date -
May 22, 2014
filing date -
May 27, 2013
priority date (Note) -
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status (Latency Note)
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Abstract
An imprinting method of this disclosure includes supplying an imprint material on a substrate having a pattern including a mark on the substrate formed thereon; bringing a mold having a pattern including a mark on the mold into contact with the imprint material; curing the imprint material in a state in which the mold is in contact therewith; and forming a pattern including the mark on the imprint material, and characterized in that an optical system configured to form an image of the mark on the imprint material and an image of the mark on the substrate are used to detect the mark on the imprint material and the mark on the substrate after the space between the substrate and the mold has been increased until the mark on the mold is positioned out of a focal depth of the optical system, thereby obtaining a relative positional deviation between the pattern on the substrate and the pattern on the imprint material.
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