POLISHING COMPOSITION
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United States of America Patent
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Issued Date -
Nov 27, 2014
app pub date -
Dec 25, 2012
filing date -
Dec 28, 2011
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Abstract
A polishing composition of the present invention is to be used for polishing an object including a metal portion or an interlayer insulation film. The polishing composition contains silica on which an organic acid, such as a sulfonic acid and a carboxylic acid, is immobilized and an oxidizing agent.
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