CENTER FLEX SINGLE SIDE POLISHING HEAD
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United States of America Patent
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May 31, 2014
filing date -
May 31, 2013
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Abstract
A polishing head assembly for single side polishing of silicon wafers includes a polishing head and a cap. The polishing head includes a top surface and a bottom surface and defines a longitudinal axis extending therethrough. The cap is positioned coaxially with the polishing head and includes an upper surface and a lower surface. The upper surface is spaced from the bottom surface of the polishing head to form a chamber that allows the cap to deflect toward the polishing head.
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