INSPECTION APPARATUS AND INSPECTION METHOD

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United States of America Patent

SERIAL NO

14109575

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Abstract

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In accordance with an embodiment, an inspection apparatus includes an electron beam applying unit, a voltage applying unit, a substantially flat component with a lattice pattern, and a first detector. The electron beam applying unit generates an electron beam and applies the electron beam to a sample at a first voltage. The voltage applying unit applies a second voltage to the sample. The polarity of the second voltage is opposite to that of the first voltage. The absolute value of the second voltage exceeds the absolute value of the first voltage. The component is provided at a position where the electron beam specularly reflected by the second voltage before reaching the sample is focused. The first detector detects a secondary electron generated from the component which the specularly reflected electron beam has entered and outputs a first signal.

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Patent Owner(s)

Patent OwnerAddress
KABUSHIKI KAISHA TOSHIBA1-1 SHIBAURA 1-CHOME MINATO-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
IKEDA, Takahiro Yokohama-Shi, JP 147 1188

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