Cleaning liquid for semiconductor device and method for cleaning substrate for semiconductor device

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United States of America Patent

PATENT NO 10113141
APP PUB NO 20140371124A1
SERIAL NO

14461908

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An object of the present invention is to provide a good cleaning liquid for semiconductor device which is used after a CMP step, and the present invention relates to a cleaning liquid for semiconductor device containing the following components (1) to (5) or (1)′ to (4)′:

    (1) an inorganic alkali;(2) a chelating agent;(3) an anionic surfactant selected from sulfonic acid type and sulfuric acid type anionic surfactants;(4) an amine oxide type surfactant; and(5) water, or(1)′ an inorganic alkali;(2)′ a carboxyl group-containing chelating agent;(3)′ an anionic surfactant selected from a benzenesulfonic acid substituted with an alkyl group having from 8 to 20 carbon atoms and a salt thereof; and(4)′ water.

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Patent Owner(s)

  • MITSUBISHI CHEMICAL CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Harada, Ken Fukuoka, JP 40 206
Ito, Atsushi Fukuoka, JP 517 4795
Suzuki, Toshiyuki Fukuoka, JP 316 3892

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