Imprint method, imprint apparatus, and method for manufacturing device

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United States of America Patent

PATENT NO 9952504
SERIAL NO

14313864

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Abstract

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An imprint method for transferring a pattern to an imprint material supplied to a plurality of shot areas on a substrate using a mold includes removing a foreign matter attached to a pattern of the mold in such a manner that the plurality of shot areas includes a part shot-area where a part of pattern of the mold can be formed and the mold is brought into contact with an imprint material supplied to the part shot-area to transfer the pattern of the mold to the substrate and transferring a pattern to the shot area excluding the part shot-area, among the plurality of shot areas, using the mold used in the removing the foreign matter.

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Patent Owner(s)

  • CANON KABUSHIKI KAISHA

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Miyajima, Yoshikazu Utsunomiya, JP 57 998
Shudo, Shinichi Utsunomiya, JP 13 27
Takabayashi, Yukio Saitama, JP 31 631

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