Method for developing resist, method for forming a resist pattern, method for producing a mold, and developing fluid utilized in these methods
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United States of America Patent
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Aug 16, 2016
Grant Date -
Jan 8, 2015
app pub date -
Sep 26, 2014
filing date -
Mar 30, 2012
priority date (Note) -
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Abstract
A method for developing a non chemically amplified resist employs a developing fluid having a carboxylic acid compound, which is a carboxylic acid ester having branched chain alkyl groups and a total carbon number of 8 or greater, as a main component. It is particularly preferable for the carboxylic acid compound to be at least one of isobutyl butyrate, butyl isobutyrate, isobutyl isobutyrate, isoamyl isobutyrate, and 2-methylbutyrate 2-methylbutyl. It is also preferable for the non chemically amplified resist to be a resist having a copolymer of an α-chloroacrylate ester compound and an α-methylstyrene compound as a main component.
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