VAPOR PHASE GROWTH APPARATUS AND VAPOR PHASE GROWTH METHOD
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United States of America Patent
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Issued Date -
Jan 15, 2015
app pub date -
Jul 2, 2014
filing date -
Jul 8, 2013
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Abstract
A vapor phase growth apparatus of an embodiment includes: a reaction chamber; a first gas supply path configured to supply a first process gas including organic metal and a carrier gas into the reaction chamber; a second gas supply path configured to supply a second process gas including ammonia into the reaction chamber; a first carrier gas supply path configured to supply a first carrier gas of a hydrogen or inert gas into the first gas supply path while being connected to the first gas supply path and including a first mass flow controller; and a second carrier gas supply path configured to supply a second carrier gas of a hydrogen or inert gas different from the first carrier gas into the first gas supply path while being connected to the first gas supply path and including a second mass flow controller.
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