Ferromagnetic Material Sputtering Target Containing Chromium Oxide
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United States of America Patent
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Issued Date -
Jan 15, 2015
app pub date -
Jan 15, 2013
filing date -
Feb 23, 2012
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Abandoned
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Abstract
Provided is a ferromagnetic material sputtering target containing a matrix phase made of cobalt, or cobalt and chromium, or cobalt and platinum, or cobalt, chromium and platinum, and an oxide phase including at least a chromium oxide, wherein the sputtering target contains one or more types of Zr and W in a total amount of 100 wt ppm or more and 15000 wt ppm or less, and has a relative density of 97% or higher. An object of this invention is to provide a ferromagnetic material sputtering target containing chromium oxide with low generation of particles capable of maintaining high density and with uniformly pulverized oxide phase grains.
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