UNDERLYING FILM COMPOSITION FOR IMPRINTS AND PATTERN FORMING METHOD USING THE SAME

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United States of America Patent

SERIAL NO

14495289

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Abstract

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Provided is an underlying film composition for imprints showing a good adhesiveness with a base and capable of reducing failure or defect of resist pattern. The underlying film composition for imprints comprising a curable main component and a urea-based crosslinking agent.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATIONTOKYO 106-8620

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ENOMOTO, Yuichiro Haibara-gun, JP 38 338
HATTORI, Akiko Haibara-gun, JP 15 108
KITAGAWA, Hirotaka Haibara-gun, JP 43 228
OOMATSU, Tadashi Haibara-gun, JP 17 97

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