Importance

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Abstract

A sputtering device includes: a vacuum chamber; a vacuum pump for evacuating the vacuum chamber; a supply roll for supplying a long film; a storage roll for storing the long film; a film depositing roll that is provided in the vacuum chamber and conveys the long film along a surface thereof; a target facing the film depositing roll; a gas pipe for supplying a gas into the vacuum chamber; a plurality of guide rolls for guiding the long film; a plurality of guide roll shafts provided at each of both ends of the plurality of guide rolls; a plurality of bearings for supporting the guide roll shafts; and a plurality of insulators configured to insulate the guide roll shafts and the bearings from each other, wherein contact surfaces of the guide rolls with the long film are kept at a floating potential.

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First Claim