Vapor Deposition Apparatus for Continuous Deposition of Multiple Thin Film Layers on a Substrate
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Jan 29, 2015
app pub date -
Jul 26, 2013
filing date -
Jul 26, 2013
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A vapor deposition apparatus to form stacked thin films on discrete photovoltaic module substrates conveyed in a continuous non-stop manner through said apparatus is provided. The apparatus includes a first sublimation compartment positioned over a first deposition area of said apparatus and a second sublimation compartment positioned over a second deposition area of said apparatus. The first sublimation compartment is configured to heat a first source material therein to sublimate the first source material into first source material vapors. A movable first shutter plate within the first sublimation compartment is configured to control the flow rate of the first source material vapors therethrough. Similarly, the second sublimation compartment is configured to heat a second source material therein to sublimate the second source material into second source material vapors, and includes a movable first shutter plate configured to control the flow rate of the second source material vapors therethrough.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully