Method and system for continuous atomic layer deposition

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United States of America Patent

PATENT NO 9598769
SERIAL NO

14339058

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Abstract

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A system and method for continuous atomic layer deposition. The system and method includes a housing, a moving bed which passes through the housing, a plurality of precursor gases and associated input ports and the amount of precursor gases, position of the input ports, and relative velocity of the moving bed and carrier gases enabling exhaustion of the precursor gases at available reaction sites.

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Patent Owner(s)

Patent OwnerAddress
UCHICAGO ARGONNE LLC5801 SOUTH ELLIS AVENUE CHICAGO IL 60637

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Elam, Jeffrey W Elmhurst, US 95 2631
Libera, Joseph A Clarendon Hills, US 18 120
Yanguas-Gil, Angel Naperville, US 13 70

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