Field effect transistor and method of manufacture

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United States of America Patent

PATENT NO 9847415
SERIAL NO

14523076

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Abstract

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A semiconductor structure and method of manufacture and, more particularly, a field effect transistor that has a body contact and method of manufacturing the same is provided. The structure includes a device having a raised source region of a first conductivity type and an active region below the raised source region extending to a body of the device. The active region has a second conductivity type different than the first conductivity type. A contact region is in electric contact with the active region. The method includes forming a raised source region over an active region of a device and forming a contact region of a same conductivity type as the active region, wherein the active region forms a contact body between the contact region and a body of the device.

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Patent Owner(s)

  • GLOBALFOUNDRIES INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Botula, Alan B Essex Junction, US 52 639
Joseph, Alvin J Williston, US 129 1208
Luce, Stephen E Underhill, US 56 1407
Pekarik, John J Underhill, US 97 395
Shi, Yun South Burlington, US 90 1219

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