Semiconductor Package with Reduced Thickness
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United States of America Patent
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Issued Date -
Feb 12, 2015
app pub date -
Aug 6, 2014
filing date -
Aug 6, 2013
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A method for forming a reduced thickness semiconductor package is disclosed and may include providing a first die with an active layer, a through-silicon via (TSV), and a pattern and an under bump metal (UBM) in a dielectric layer on the active layer. A carrier may be bonded to the dielectric layer and the UBM. The first die may be thinned to expose the TSV. A bump pad may be formed on the exposed TSV and a second die may be bonded to the bump pad. The first die, the second die, and an outer surface of the dielectric layer may be encapsulated utilizing a first encapsulant. The carrier may be removed from the dielectric layer and the UBM, and a solder ball may be formed on the UBM. A groove may be formed through the dielectric layer and into the first die.
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