CLEAVING THIN LAYER FROM BULK MATERIAL AND APPARATUS INCLUDING CLEAVED THIN LAYER

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United States of America Patent

APP PUB NO 20150044447A1
SERIAL NO

14523368

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Abstract

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Embodiments relate to use of a particle accelerator beam to form thin layers of material from a bulk substrate. In particular embodiments, a bulk substrate (e.g. donor substrate) having a top surface is exposed to a beam of accelerated particles. In certain embodiments, this bulk substrate may comprise a core of crystalline sapphire (Al2O3) material. Then, a thin layer of the material is separated from the bulk substrate by performing a controlled cleaving process along a cleave region formed by particles implanted from the beam. Embodiments may find particular use as hard, scratch-resistant covers for personal electric device displays such as mobile phones or tablets, or as optical surfaces for fingerprint, eye, or other biometric scanning.

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Patent Owner(s)

Patent OwnerAddress
SILICON GENESIS CORPORATION61 DAGGETT DRIVE SAN JOSE CA 95134

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HENLEY, Francois J Aptos, US 178 9676

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