Nanowires coated on traces in electronic devices

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United States of America Patent

PATENT NO 9627320
SERIAL NO

13976008

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Abstract

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Methods and devices including the formation of a layer of nanowires on wiring line traces are described. One device comprises a first dielectric layer and a plurality of traces on the first dielectric layer, the traces comprising Cu. The traces include a layer of ZnO nanowires positioned thereon. A second dielectric layer is positioned on the first dielectric layer and on the traces, wherein the second dielectric layer is in direct contact with the ZnO nanowires. Other embodiments are described and claimed.

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Patent Owner(s)

  • INTEL CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jaiswal, Bhanu Chandler, US 3 6
Panat, Rahul Chandler, US 13 52

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