NOZZLE, AND SUBSTRATE PROCESSING APPARATUS

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United States of America Patent

SERIAL NO

14529559

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Abstract

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A nozzle for discharging droplets of a processing liquid for processing a substrate has a main body including a supply port, a drain port, a processing liquid flow passageway connecting the supply port and the drain port, and a plurality of discharge ports from which the processing liquid is discharged. The processing liquid flow passageway includes a plurality of branch flow channels, which branch out between the supply port and the drain port and collect together between the supply port and the drain port. The plurality of discharge ports form a plurality of columns respectively corresponding to the plurality of branch flow channels; and are aligned along and connected to the corresponding branch flow channels. A piezo element applies vibration to the processing liquid flowing through the plurality of branch flow channels.

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Patent Owner(s)

Patent OwnerAddress
SCREEN HOLDINGS CO LTDKYOTO JAPAN KYOTO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HIGUCHI, Ayumi Kyoto, JP 30 131
SATO, Masanobu Kyoto, JP 141 1042
TAKEAKI, Rei Kyoto, JP 12 39
TANAKA, Takayoshi Kyoto, JP 53 282
YAMAKAWA, Mai Kyoto, JP 3 23
YASHIKI, Hiroyuki Kyoto, JP 11 100

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