APPARATUS FOR PROCESSING SUBSTRATE AND METHOD OF CLEANING SAME
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United States of America Patent
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Issued Date -
Mar 5, 2015
app pub date -
Aug 29, 2014
filing date -
Aug 30, 2013
priority date (Note) -
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status (Latency Note)
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Abstract
Provided is an apparatus for processing a substrate including a spin head on which a substrate is placed, a container provided to surround the spin head, an upper nozzle member supplying a processing solution downwards, a bottom cleaning member located to be a certain distance from the bottom of the spin head, wherein the bottom cleaning member sprays a cleaning solution to the bottom of the spin head.
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