SUBSTRATE TREATMENT DEVICE AND METHOD OF APPLYING TREATMENT SOLUTION
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United States of America Patent
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Issued Date -
Mar 5, 2015
app pub date -
Aug 29, 2014
filing date -
Aug 30, 2013
priority date (Note) -
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status (Latency Note)
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Abstract
Provided is a substrate treatment device. The device includes: a substrate support member supporting a substrate to be treated; a rotation driving member rotating the substrate support member; a container provided around the substrate support member; and a treatment solution supply unit including a photoresist nozzle for supplying a photoresist to a top surface of the substrate, wherein the photoresist nozzle starts supplying the photoresist while the substrate support member rotates at a first supply speed and stops supplying the photoresist while the substrate support member rotates at a second supply speed decelerated from the first supply speed.
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