WAFER-SHAPED TOOL CONFIGURED TO MONITOR PLASMA CHARACTERISTICS AND PLASMA MONITORING SYSTEM USING THE SAME

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United States of America Patent

APP PUB NO 20150076328A1
SERIAL NO

14324652

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Provided are tools and systems to monitor plasma characteristics. The tool may include a housing, and a sensor array, a signal processor, and a data-transferring device provided in the housing. The sensor array may include a plurality of measurement sensors two-dimensionally arranged in the housing, each of the measurement sensors including a shielding layer configured to prevent an electrical interaction with charged particles in plasma, the signal processor may be configured to process electrical signals produced by the measurement sensors, and thereby generate measurement data, and the data-transferring device may be configured to transmit the measurement data to the outside.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTDSUWON-SI

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
JUNG, Jaechul Seoul, KR 2 1
LEE, Sangheon Seongnam-si, KR 59 417
SHIN, Dong Ok Suwon-si, KR 23 35

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